ESPRIT '88: Putting the Technology to Use : Proceedings of the 5th Annual ESPRIT Conference, Brussels, November 14-17, 1988, Part 1North-Holland, 1988 - 1759 pages Part1. Advanced microelectronics. VLSI technologies - comparisons and prospects. Software technology. Advanced information processing. Part2. Office systems.Computer integrated manufacturing. Information exchange system. |
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Page 113
Epi substrate p/p-H th=10 pum Oxynitride deposition Photo + etch active areas
Photo well stepper projection Well implant (P + As) and drive-in Photo + field
implant BF2 LOCOS (0.7 um) Gate oxide (25 nm) Photo NMOST + double B
implant ...
Epi substrate p/p-H th=10 pum Oxynitride deposition Photo + etch active areas
Photo well stepper projection Well implant (P + As) and drive-in Photo + field
implant BF2 LOCOS (0.7 um) Gate oxide (25 nm) Photo NMOST + double B
implant ...
Page 130
Table 2: Main features of Computer Control • Computer control based on two Intel
8086 microprocessors to process 16-bit data. • Complete automation of etch
process, wafer transport and vacuum control. - End-point detection in real time.
Table 2: Main features of Computer Control • Computer control based on two Intel
8086 microprocessors to process 16-bit data. • Complete automation of etch
process, wafer transport and vacuum control. - End-point detection in real time.
Page 137
574 PERFORMANCE OF AN 8" RIE ETCHING SYSTEM: THE EFFECT OF
CATHODE COWER MATERIALS P. Hoffmann, F. Heinrich, W. Pilz, H.-C. Scheer
Fraunhofer Institut fuer Mikrostrukturtechnik, IMT, Berlin, FRG I. Hussla Leybold
AG, ...
574 PERFORMANCE OF AN 8" RIE ETCHING SYSTEM: THE EFFECT OF
CATHODE COWER MATERIALS P. Hoffmann, F. Heinrich, W. Pilz, H.-C. Scheer
Fraunhofer Institut fuer Mikrostrukturtechnik, IMT, Berlin, FRG I. Hussla Leybold
AG, ...
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Contents
Technology Transfer from Research to Development Project 97 Pype P Van Meerbergen J De Man | 5 |
Materials and Devices Toward ThreeDimensional Integration Project 245 Cahill C G Dunne B OFlanagan S Hobbs L Mathewson A | 21 |
Physical ºquivalentCircuit Models for GaAs Mesſets Project 255 Ghione G Naldi C Pettenpaul E Ponse F | 52 |
Copyright | |
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Common terms and phrases
abstract abstract machine algorithm allows analysis Aphrodite application approach architecture Artificial Intelligence basic behaviour BFNEW BICMOS cell chip circuit CMOS complex components Computer concepts constraints DAIDA database defined definition described devices distributed domain dynamic environment error Esprit Project etch evaluation example execution expert systems Figure function GaAs gate global goal graphical GRASPIN IEEE implementation information system input integrated interaction interpreter knowledge base knowledge representation language layer LFSR logic programming machine mapping MESFET metaclass method methodology migration module node object-oriented objects operations output parallel parameters partial evaluation PCTE performance phase PIMS possible predicates problem procedure processor programming language project management Prolog Prolog III prototype query representation requirements rules semantic signal simulation specification structure subcircuit task techniques transistor transputer UNIX user interface VLSI wafer